Dense, Defect-free Coatings with HIPIMS and HIPIMS⁺

Physical Vapour Deposition coatings (PVD coatings) are mainly deposited by either arc evaporation or magnetron sputtering. High Power Impulse Magnetron Sputtering (HIPIMS) has given a third dimension to PVD coating technology. HIPIMS technology shows that it is possible to combine the advantages of high ionization like arc evaporation with the advantages of magnetron sputtering. The result is good adhesion and a dense, very smooth coating.

HIPIMS technology is extremely suitable for etching. Due to the high peak power of up to 8 MW, the atoms sputtered with HIPIMS will enter into the substrate to give a dense, columnar layer with a strong adhesive character. Coating with HIPIMS is also possible, but it has a deposition rate considerably lower than present sputter technologies.

Hauzer has developed an alternative HIPIMS technology, called HIPIMS⁺ which is very suitable for coating. HIPIMS⁺ has a high deposition rate comparable to arc evaporation, which makes the HIPIMS⁺ technology suitable for industrial purposes. Another advantage of HIPIMS⁺ is better target utilization and the possibility to achieve a tuneable residual stress while maintaining a high hardness. Several HIPIMS+ coatings are suitable for low deposition temperatures. Many different PVD coatings can be applied with HIPIMS⁺ technology, such as TiN, TiAlN, TiCN, CrN, Cr₂N. HIPIMS⁺ has been tested and found suitable for applications such as mould & dies, milling inserts, thread turning inserts, end mills and taps.

Both technologies, HIPIMS and HIPIMS⁺, result in a dense and defect-free PVD coating. HIPIMS as well as HIPIMS⁺ are both available on Hauzer Flexicoat ^® equipment. Of course HIPIMS and HIPIMS⁺ are also available as an upgrade on existing Hauzer PVD coating equipment.

For more information, please download the article Industrial Impact of HIPIMS and HIPIMS⁺ Technology.

In April 2010, Hauzer published the article (to be downloaded): Excellent Test Results with HIPIMS+ Technology.